Etching Tray Semiconductor Consumables Sintered Silicon Carbide Ceramic

Etching Tray Semiconductor Consumables

Main features

The etching tray is made of high purity sintered silicon carbide ceramics without pressure.It has the characteristics of high hardness, corrosion resistance, wear resistance, long service life, high precision and good etching uniformity of wafer epitaxy layer.

Application

ICP etching process of epitaxial film materials(GaN, SiO 2, etc.) for LED wafer chips, precision ceramic parts for semiconductor diffusion and MOCVD epitaxy process for semiconductor wafers.

Specification:

Diameter range: 50~500mm. thickness:3~20mm, custom-made specifications are available.

Etching Tray Semiconductor Consumables

Sintered Silicon Carbide Ceramic Etching Tray

Sintered Silicon Carbide Etching Tray

Etching Tray Semiconductor Consumables Sintered Silicon Carbide Ceramic Images